2Japan
Ultra-high Temperature Materials Research Institute, Ube, Yamaguchi,
Japan
3Tokyo
Dental College, Mihama, Chiba, Japan
Abstract
Ti films, of 5 mm thickness were deposited uniformly on
three-dimensional structures of carbon foam substrates using an electron
cyclotron resonance (ECR) sputtering system. A cylindrical hollow
cathode with internal diameter of 80 mm and external diameter of 90 mm
and length of 60 mm, negatively biased, was used as Ti atoms supplier.
The dc sputtering voltage applied to the target
controlled the feeding with excited Ti atoms. The hardness of the films
was found to be in the range of 250-300 HV and exhibited a significant
indentation load effect. The film surfaces were smooth and showing a
pure Ti preferentially grown on the 100 crystallographic phase. Flexural
strength and elastic modulus of the carbon foam were improved by a
factor of 1.5 and 2.6 respectively.